| 发明名称 |
MANUFACTURING METHOD FOR Si02-Ti02 BASED GLASS, MANUFACTURING METHOD FOR PLATE-SHAPED MEMBER MADE OF Si02-Ti02 BASED GLASS, MANUFACTURING DEVICE, AND MANUFACTURING DEVICE FOR Si02-Ti02 BASED GLASS |
| 摘要 |
A method for manufacturing an SiO2—TiO2 based glass upon a target by a direct method, includes a first process of preheating the target and a second process of growing an SiO2—TiO2 based glass ingot to a predetermined length upon the target which has been preheated, wherein the target is heated in the first process such that, in the second process, the temperature of growing surface of the glass ingot is maintained at or above a predetermined lower limit temperature. |
| 申请公布号 |
US2015114040(A1) |
申请公布日期 |
2015.04.30 |
| 申请号 |
US201414582237 |
申请日期 |
2014.12.24 |
| 申请人 |
NIKON CORPORATION |
发明人 |
YOSHINARI Toshio;Saito Tadahiko |
| 分类号 |
C03B19/14;C03B11/00;C03C3/04 |
主分类号 |
C03B19/14 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method for manufacturing an SiO2—TiO2 based glass upon a target by a direct method, comprising:
a first process of preheating the target; and a second process of growing an SiO2—TiO2 based glass ingot to a predetermined length upon the target which has been preheated, wherein the target is heated in the first process such that, in the second process, the temperature of growing surface of the glass ingot is maintained at or above a predetermined lower limit temperature. |
| 地址 |
Tokyo JP |
