| 摘要 |
PROBLEM TO BE SOLVED: To provide a more efficient marking method, relating to a marking method for a monocrystal wafer which is transparent and does not absorb nitrogen visible light.SOLUTION: A marking method includes a step in which an ingot of a monocrystal semiconductor which is transparent to visible light is processed in cylindrical shape, a step in which marking is made with a constant interval along a direction running from an upper surface of the ingot toward a bottom surface, and a step in which the ingot is cut along a surface that faces the upper surface and the bottom surface, between the markings. |
