发明名称 半導体装置
摘要 <p>It is an object to provide a highly reliable semiconductor device including a thin film transistor whose electric characteristics are stable. In addition, it is another object to manufacture a highly reliable semiconductor device at low cost with high productivity. In a semiconductor device including a thin film transistor, a semiconductor layer of the thin film transistor is formed with an oxide semiconductor layer to which a metal element is added. As the metal element, at least one of metal elements of iron, nickel, cobalt, copper, gold, manganese, molybdenum, tungsten, niobium, and tantalum is used. In addition, the oxide semiconductor layer contains indium, gallium, and zinc.</p>
申请公布号 JP5696238(B2) 申请公布日期 2015.04.08
申请号 JP20140009425 申请日期 2014.01.22
申请人 发明人
分类号 H01L29/786;G02F1/1368;G09F9/30 主分类号 H01L29/786
代理机构 代理人
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