发明名称 Charge trapping transistor
摘要 <p>The device has a source section, a drain section, a gate section and a floating gate, which is arranged in an aperture in the gate section. The floating gate consists of dielectric material with fault points permitting the storage of electrons. The floating gate is formed by a nitride and the aperture passes through the gate section from above to below.</p>
申请公布号 EP1341239(B1) 申请公布日期 2015.04.01
申请号 EP20020004568 申请日期 2002.02.27
申请人 INFINEON TECHNOLOGIES AG 发明人 ATTI, MASSIMO;SCHULZ, THOMAS;SPECHT, MICHAEL, DR.;HOFMANN, FRANZ, DR.
分类号 H01L29/792;H01L29/423 主分类号 H01L29/792
代理机构 代理人
主权项
地址