发明名称 |
PHOTO DIODE AND METHOD OF FORMING THE SAME |
摘要 |
Provided in the present invention is a method for forming photodiodes. The method comprises the steps of: forming a first lower electrode corresponding to a first pixel and a second lower electrode corresponding to a second pixel on a substrate; forming a dielectric layer on the substrate; patterning the dielectric layer on the substrate; forming a photo conversion layer on the substrate; forming an upper electrode on the photo conversion layer; and forming a color filter layer on the upper electrode. A part of the dielectric layer separates a first part of the color filter layer corresponding to the first pixel from a second part of the color filter layer corresponding to the second pixel, and a refractive index of the dielectric layer is a refractive index of the color filter layer or less. |
申请公布号 |
KR20150031175(A) |
申请公布日期 |
2015.03.23 |
申请号 |
KR20140112565 |
申请日期 |
2014.08.27 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
WANG TZU JUI;CHOU KENG YU;CHUANG CHUN HAO;HSU MING CHIEH;YAMASHITA YUICHIRO;LIU JEN CHENG;YAUNG DUN NIAN |
分类号 |
H01L27/146 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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