发明名称 PHOTO DIODE AND METHOD OF FORMING THE SAME
摘要 Provided in the present invention is a method for forming photodiodes. The method comprises the steps of: forming a first lower electrode corresponding to a first pixel and a second lower electrode corresponding to a second pixel on a substrate; forming a dielectric layer on the substrate; patterning the dielectric layer on the substrate; forming a photo conversion layer on the substrate; forming an upper electrode on the photo conversion layer; and forming a color filter layer on the upper electrode. A part of the dielectric layer separates a first part of the color filter layer corresponding to the first pixel from a second part of the color filter layer corresponding to the second pixel, and a refractive index of the dielectric layer is a refractive index of the color filter layer or less.
申请公布号 KR20150031175(A) 申请公布日期 2015.03.23
申请号 KR20140112565 申请日期 2014.08.27
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 WANG TZU JUI;CHOU KENG YU;CHUANG CHUN HAO;HSU MING CHIEH;YAMASHITA YUICHIRO;LIU JEN CHENG;YAUNG DUN NIAN
分类号 H01L27/146 主分类号 H01L27/146
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