| 发明名称 |
SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS |
| 摘要 |
A substrate treatment method is provided, which includes a liquid film retaining step of retaining a liquid film of a treatment liquid on a major surface of a substrate, and a heater heating step of locating a heater in opposed relation to the major surface of the substrate to heat the treatment liquid film by the heater in the liquid film retaining step, wherein an output of the heater is changed from a previous output level in the heater heating step. |
| 申请公布号 |
US2015068557(A1) |
申请公布日期 |
2015.03.12 |
| 申请号 |
US201414456007 |
申请日期 |
2014.08.11 |
| 申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
NEGORO Sei;NAGAI Yasuhiko;IWATA Keiji |
| 分类号 |
B08B3/08;B08B3/10 |
主分类号 |
B08B3/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate treatment method comprising:
a liquid film retaining step of retaining a liquid film of a treatment liquid on a major surface of a substrate; and a heater heating step of locating a heater in opposed relation to the major surface of the substrate to heat the treatment liquid film by the heater in the liquid film retaining step; wherein an output of the heater is changed from a previous output level in the heater heating step. |
| 地址 |
Kyoto JP |
