发明名称 PRODUCTION METHOD FOR CONDUCTIVE FILM
摘要 <p>The present invention provides a production method for a conductive film, whereby a conductive film having reduced occurrence of defects and excellent conductivity can be produced. This production method for a conductive film comprises: a step in which a dispersion liquid including copper oxide particles having an average particle diameter of no more than 100 nm is coated upon a base material, and a precursor film including copper oxide particles is formed; and a step in which a laser light having a wavelength of 9-11 µm is irradiated on and relatively scans the precursor film, the copper oxide particles in a scanning area in which the laser light was irradiated are reduced, and a conductive film including copper metal is formed. The film thickness of the precursor film is 0.5-30 µm, the scanning speed is 10-120 mm/s, the thermal conductivity (A [W/(m·k)]) of the base material and the output (W [W]) of the laser light fulfil the relationship indicated by formula 1, and the thermal conductivity (A) of the base material is at least 0.014. Formula 1: 1.39 + 0.3252 Ln (A)≤W≤3.00 + 0.3252 Ln (A).</p>
申请公布号 WO2015033823(A1) 申请公布日期 2015.03.12
申请号 WO2014JP72329 申请日期 2014.08.26
申请人 FUJIFILM CORPORATION 发明人 SASADA MISATO;OHTA HIROSHI;USAMI YOSHIHISA
分类号 H01B13/00;B23K26/00;C23C26/00;H05K3/10 主分类号 H01B13/00
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