发明名称 荷電粒子ビーム処理
摘要 <p>Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate (54). The beam (12,13) preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes.</p>
申请公布号 JP5684485(B2) 申请公布日期 2015.03.11
申请号 JP20100049963 申请日期 2010.03.06
申请人 发明人
分类号 H01J37/30;B82B3/00 主分类号 H01J37/30
代理机构 代理人
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