| 摘要 |
FIELD: physics, optics.SUBSTANCE: invention relates to production of high-quality optical materials, particularly materials having resistance to optical damage. The method of preventing damage to optical components caused by high-intensity light sources includes etching an optical component in an etching solution containing hydrofluoric acid, fluoride ions and bifluoride ions. The method also includes megasonic and ultrasonic agitation of the etching solution during the process, followed by washing the optical component in a wash bath and jet washing.EFFECT: high resistance of optical materials made of fused quartz to high energy density radiation, particularly in the ultraviolet range.11 cl 3 dwg |
