| 摘要 |
<p>A photosensitive resin composition for a black resist, a light screening film formed byusing the composition, and a color filter for a ink-jet process color filter containing the light screening film are provided to improve pattern size dimensional stability in case of a thick film of 1.5 micrometers or more and to enhance development margin, pattern adhesion and clearness of pattern edge shape. A photosensitive resin composition for a black resist comprises a radiation curing resin and/or a radiation curing monomer; at least one light screening pigment selected from a black organic pigment, a mixed color organic pigment and a light screening material; and a granular silica, wherein the primary particle size of the granular silica has an average of 10-50 nm, the ratio of the average of the primary particle size of the granular silica/that of the light screening pigment is 0.2-5.0; and the ratio of the weight of the granular silica/that of the light screening pigment is 0.1-1.0.</p> |
