Defect inspecting apparatus and defect inspecting method

摘要

An invention being applied is a defect detecting apparatus that has: an illuminating optical system with a laser light source for irradiating a sample on whose surface a pattern is formed with light; a detecting optical system with a sensor for detecting light generated from the sample illuminated by the illuminating optical system; and a signal processing unit that extracts a defect from an image based on the light detected by the detecting optical system, in which an amplification rate of the sensor is dynamically changed during a time when the light is detected by the detecting optical system.

主权项

1. A defect inspecting apparatus, comprising:
an illuminating optical system having a laser light source for irradiating a sample; a detecting optical system having a sensor for detecting light generated from the sample; and a signal processing unit that extracts a defect from an image generated from the light, wherein an amplification rate of the sensor is set based on brightness information from a predetermined image, and wherein the amplification rate is dynamically adjusted during a time the light is detected.