| 摘要 |
PROBLEM TO BE SOLVED: To provide a susceptor capable of reducing production cost of a silicon carbide film formed on a silicon carbide substrate by reducing exchange frequency of a component of a silicon carbide film deposition apparatus furthermore than hitherto, and to provide a cleaning method of the susceptor.SOLUTION: The susceptor has a susceptor body 11 having a recessed part 14 on an upper surface 11a side, and a substrate storage member 12 arranged detachably with respect to the recessed part 14, for storing a silicon carbide substrate 30 with an aperture interposed between itself and an outer peripheral edge 30A of the silicon carbide substrate 30 having a surface 30a on which a silicon carbide film is to be formed. |
