发明名称 |
CATALYTIC ETCH WITH MAGNETIC DIRECTION CONTROL |
摘要 |
A material can be locally etched with arbitrary changes in the direction of the etch. A ferromagnetic-material-including catalytic particle is employed to etch the material. A wet etch chemical or a plasma condition can be employed in conjunction with the ferromagnetic-material-including catalytic particle to etch a material through a catalytic reaction between the catalytic particle and the material. During a catalytic etch process, a magnetic field is applied to the ferromagnetic-material-including catalytic particle to direct the movement of the particle to any direction, which is chosen so as to form a contiguous cavity having at least two cavity portions having different directions. The direction of the magnetic field can be controlled so as to form the contiguous cavity in a preplanned pattern, and each segment of the contiguous cavity can extend along an arbitrary direction. |
申请公布号 |
US2015044426(A1) |
申请公布日期 |
2015.02.12 |
申请号 |
US201414521948 |
申请日期 |
2014.10.23 |
申请人 |
International Business Machines Corporation |
发明人 |
Joseph Eric A.;Abraham David W.;Cheek Roger W.;Schrott Alejandro G.;Zhang Ying |
分类号 |
H01L21/308;H01L29/16;H01L29/06 |
主分类号 |
H01L21/308 |
代理机构 |
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代理人 |
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主权项 |
1. A patterned structure comprising:
a substrate having a surface; and a plurality of contiguous cavities extending from said surface into said substrate, wherein each of said plurality of contiguous cavities comprises at least a first cavity portion extending along a first direction and a second cavity portion extending along a second direction, wherein said first direction and said second direction are different. |
地址 |
Armonk NY US |