发明名称 CATALYTIC ETCH WITH MAGNETIC DIRECTION CONTROL
摘要 A material can be locally etched with arbitrary changes in the direction of the etch. A ferromagnetic-material-including catalytic particle is employed to etch the material. A wet etch chemical or a plasma condition can be employed in conjunction with the ferromagnetic-material-including catalytic particle to etch a material through a catalytic reaction between the catalytic particle and the material. During a catalytic etch process, a magnetic field is applied to the ferromagnetic-material-including catalytic particle to direct the movement of the particle to any direction, which is chosen so as to form a contiguous cavity having at least two cavity portions having different directions. The direction of the magnetic field can be controlled so as to form the contiguous cavity in a preplanned pattern, and each segment of the contiguous cavity can extend along an arbitrary direction.
申请公布号 US2015044426(A1) 申请公布日期 2015.02.12
申请号 US201414521948 申请日期 2014.10.23
申请人 International Business Machines Corporation 发明人 Joseph Eric A.;Abraham David W.;Cheek Roger W.;Schrott Alejandro G.;Zhang Ying
分类号 H01L21/308;H01L29/16;H01L29/06 主分类号 H01L21/308
代理机构 代理人
主权项 1. A patterned structure comprising: a substrate having a surface; and a plurality of contiguous cavities extending from said surface into said substrate, wherein each of said plurality of contiguous cavities comprises at least a first cavity portion extending along a first direction and a second cavity portion extending along a second direction, wherein said first direction and said second direction are different.
地址 Armonk NY US