Calculation method for generating layout pattern in photomask

摘要

A calculation method for generating a layout pattern in a photomask includes at least the following steps. A two-dimensional design layout including several geometric patterns distributed in a plane is provided to a computer system. The computer system is used to mark portions of the geometric patterns and generate at least one marked geometric pattern and at least one non-marked geometric pattern. The marked geometric pattern is then simulated and corrected by the computer system so as to generate a 3-D design layout. Through the simulation and correction, the marked geometric pattern and the non-marked geometric pattern are arranged alternately along an axis orthogonal to the plane. The 3-D design layout is outputted to a mask-making system afterwards.

主权项

1. A calculation method for generating a layout pattern in a photomask, comprising:
providing a computer system having a computer readable storage device; providing a two-dimensional (2-D) design layout to the computer system, wherein the 2-D design layout comprises a plurality of geometric patterns distributed in a plane; marking portions of the geometric patterns to generate at least one marked geometric pattern and at least one non-marked geometric pattern; moving the marked geometric pattern along an axis orthogonal to the plane so as to convert the 2-D design layout to a three-dimensional (3-D) design layout, wherein the marked geometric pattern and the non-marked geometric pattern of the 3-D design layout are arranged alternately along the axis orthogonal to the plane; and outputting the 3-D design layout to a mask-making system.