POLISHING LIQUID FOR CMP, STORAGE LIQUID AND POLISHING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a polishing liquid for CMP which makes it possible to smoothly polish a substrate comprising aluminum material.SOLUTION: This invention relates to a polishing liquid for CMP for polishing a substrate comprising aluminum material, the polishing liquid comprising abrasive grains, at least one benzotriazol compound selected from the group consisting of benzotriazol and benzotriazol derivatives, and a liquid medium.