发明名称 CHARGED PARTICLE BEAM DEVICE CAPABLE OF EASILY ANALYZING DESIRED PART WITH EBSD DETECTOR, AND CONTROL METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a charged particle beam device capable of previously grasping an analytic part of a specimen which can be analyzed by an EBSD detector, and adjusting the specimen to a desired analysis position in a short time.SOLUTION: A charged particle beam device comprises, for example: a charged particle source which emits a charged particle beam; a charged particle optical system for irradiating a specimen with the charged particle beam; an EBSD detector for detecting backward scattering electron diffraction generated from a specimen surface by irradiation with the charged particle beam; a specimen stage which moves while supporting thereon a specimen table on which the specimen is disposed; an image display part for displaying a portion that can be observed by the EBSD detector, in the specimen and a portion that cannot be observed, in a distinctive manner; an operation input part to which a position observed by the EBSD detector is inputted; and a control part for controlling planar movement, tilted movement and rotational movement of the specimen stage so as to observe the observation position inputted from the operation input part with the EBSD detector.
申请公布号 JP2015023005(A) 申请公布日期 2015.02.02
申请号 JP20130153091 申请日期 2013.07.23
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 TAKEDA KAZUYUKI ; ANDO TORU ; SAITO TSUTOMU
分类号 H01J37/28;G01N23/203;H01J37/20;H01J37/22;H01J37/244 主分类号 H01J37/28
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