发明名称 Method for manufacturing a shadow mask
摘要 In a method for manufacturing a shadow mask, the both surfaces of a metal sheet, except those regions in which small and large openings are to be formed, are coated with resist films. The upper surface of the metal sheet is further coated with an organic synthetic film. An etching solution is sprayed on the lower surface of the metal sheet, kept in a substantially horizontal position, to etch the region corresponding to the small opening, thereby forming small recesses. Thereafter, the resist film on the lower surface is removed. Then, the metal sheet is turned over, so the surface of the metal sheet with the small recesses therein faces up, and an etching-resistant layer is formed on the surface of the metal sheet which faces up. Then, the regions corresponding to the large openings on the surface of the metal sheet which faces down is etched, to form large recesses, while keeping the metal sheet substantially horizontal, until the large recesses are reached to the resistant layer. Thus, each aperture is formed. Thereafter, the resist film and the resistant layer are removed. Thus, a shadow mask is manufactured which has a number of apertures regularly arranged therein, so the areas of the both openings of each aperture on the two surfaces of the shadow mask are different.
申请公布号 US4689114(A) 申请公布日期 1987.08.25
申请号 US19840652092 申请日期 1984.09.19
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 OHTAKE, YASUHISA;HARIGAE, MAKOTO
分类号 C23F1/00;C23F1/02;C23F1/04;G03F7/00;H01J9/14;(IPC1-7):C23F1/02;B44C1/22 主分类号 C23F1/00
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