发明名称 Low temperature metalorganic chemical vapor depostion growth of group II-VI semiconductor materials
摘要 A method for growing a Group II-VI epitaxial layer on a substrate is described. The method includes the steps of directing a plurality of vapor flows toward the substrate including a Group II metalorganic vapor, a Group VI organic vapor, with said Group VI organic having an organic group bonded to the Group VI element selected from the group consisting of a secondary alkyl, a tertiary alkyl, an allyl, a cycloallyl, and a benzyl, and a Group II elemental metal vapor. The directed flows of Group II metalorganic vapor, Group VI organic vapor and Group II metal vapor are chemically reacted to provide the epitaxial layer.
申请公布号 US4886683(A) 申请公布日期 1989.12.12
申请号 US19860876608 申请日期 1986.06.20
申请人 RAYTHEON COMPANY 发明人 HOKE, WILLIAM E.;SPECHT, LINDLEY T.;KORENSTEIN, RALPH
分类号 C23C16/18;C23C16/30;C30B25/02;C30B29/48;H01L21/205;H01L21/365 主分类号 C23C16/18
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