发明名称 薄膜之制造方法及制造装置;METHOD AND DEVICE FOR PRODUCING FILM
摘要 本案之课题在于提供一种可以较佳产率制造对热之尺寸安定性优异的薄膜之薄膜制造方法及制造装置。解决手段为一种进行薄膜之应力松弛处理之薄膜制造方法,其系使用从喷气孔对薄膜喷出加热气体而以非接触状态输送薄膜之悬浮输送装置1,且以非接触状态一边输送薄膜一边进行应力松弛处理。尤其适宜于将聚醯亚胺薄膜之前驱物加热处理所得到之聚醯亚胺薄膜之应力松弛处理。;The method of the present invention is a method for producing film by applying a stress relaxation treatment, wherein the stress relaxation treatment is applied by using a levitation conveyance device l to convey the film in a non-contacting state by injecting a heated gas from the gas injection hole to the film, and to convey the film under a non-contacting state. The method is preferably conducted with the stress relaxation treatment for a polyamide film obtained by heating treatment of a precursor of the polyimide film.
申请公布号 TW201502178 申请公布日期 2015.01.16
申请号 TW103111672 申请日期 2014.03.28
申请人 宇部兴产股份有限公司 发明人 伊藤和美;木村征克;小川佑二;广幡大树
分类号 C08J5/18(2006.01);B29C71/02(2006.01);B29L7/00(2006.01) 主分类号 C08J5/18(2006.01)
代理机构 代理人 洪武雄陈昭诚
主权项
地址 日本