| 摘要 |
A lighting system of a step-and-scan projection mask aligner. Along a beam propagation direction, the lighting system comprises a light source (1), a pupil shaping unit (2), a viewing field defining unit (3), a first lens array (41), a first slit array (51), a second lens array (42), a third lens array (43), a second slit array (52), a fourth lens array (44), a collecting lens (6), and a scanning driving unit (8). The lighting system reduces requirements on lens processing, slit scanning speed and slit scanning precision, and therefore, the lighting system can be implemented more easily. |
