POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM PREPARED FROM THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition that can have improved chemical resistance while maintaining advantages such as high transparency, and has improved stability in a post-treatment, and a cured film or a flattened film.SOLUTION: The photosensitive resin composition comprises (A) a siloxane polymer having at least one structural unit derived from a silane compound represented by formula (I), (B) an epoxy compound, and (C) a 1,2-quinonediazide compound.SELECTED DRAWING: None