发明名称 |
MANUFACTURING METHOD OF ELECTRO-OPTIC DEVICE SUBSTRATE, ELECTRO-OPTIC DEVICE SUBSTRATE, ELECTRO-OPTIC DEVICE, AND ELECTRONIC DEVICE |
摘要 |
A manufacturing method of a microlens array substrate, which is a manufacturing method of electro-optic device substrate, includes a step of forming concave portions, each of which corresponds to each of a plurality of pixels, by etching a first surface of a light transmitting substrate, a step of forming a lens layer including microlenses formed by filling at least the concave portions with a lens material having a refractive index greater than that of the substrate, a step of flattening a second surface of the lens layer opposite to a surface in which the microlenses are formed, a step of forming a light shielding film that surrounds a display area, in which each of the plurality of pixels is arranged, on the flattened second surface, and a step of forming a light transmitting path layer that covers the second surface on which the light shielding film is formed. |
申请公布号 |
US2015002790(A1) |
申请公布日期 |
2015.01.01 |
申请号 |
US201414311892 |
申请日期 |
2014.06.23 |
申请人 |
Seiko Epson Corporation |
发明人 |
Ito Satoshi |
分类号 |
G02F1/1335;G02B1/10;G02B3/00 |
主分类号 |
G02F1/1335 |
代理机构 |
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代理人 |
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主权项 |
1. A manufacturing method of electro-optic device substrate, comprising:
forming a concave portion, which corresponds to a pixel, by etching a first surface of a light transmitting substrate; forming a lens layer including a microlens formed by filling the concave portion with a lens material having a refractive index greater than that of the substrate; flattening a second surface of the lens layer opposite to a surface in which the microlens are formed; forming a light shielding film that surrounds a display area, in which the pixel is arranged, on the flattened second surface; and forming a light transmitting path layer that covers the second surface on which the light shielding film is formed. |
地址 |
Tokyo JP |