发明名称 MANUFACTURING METHOD OF ELECTRO-OPTIC DEVICE SUBSTRATE, ELECTRO-OPTIC DEVICE SUBSTRATE, ELECTRO-OPTIC DEVICE, AND ELECTRONIC DEVICE
摘要 A manufacturing method of a microlens array substrate, which is a manufacturing method of electro-optic device substrate, includes a step of forming concave portions, each of which corresponds to each of a plurality of pixels, by etching a first surface of a light transmitting substrate, a step of forming a lens layer including microlenses formed by filling at least the concave portions with a lens material having a refractive index greater than that of the substrate, a step of flattening a second surface of the lens layer opposite to a surface in which the microlenses are formed, a step of forming a light shielding film that surrounds a display area, in which each of the plurality of pixels is arranged, on the flattened second surface, and a step of forming a light transmitting path layer that covers the second surface on which the light shielding film is formed.
申请公布号 US2015002790(A1) 申请公布日期 2015.01.01
申请号 US201414311892 申请日期 2014.06.23
申请人 Seiko Epson Corporation 发明人 Ito Satoshi
分类号 G02F1/1335;G02B1/10;G02B3/00 主分类号 G02F1/1335
代理机构 代理人
主权项 1. A manufacturing method of electro-optic device substrate, comprising: forming a concave portion, which corresponds to a pixel, by etching a first surface of a light transmitting substrate; forming a lens layer including a microlens formed by filling the concave portion with a lens material having a refractive index greater than that of the substrate; flattening a second surface of the lens layer opposite to a surface in which the microlens are formed; forming a light shielding film that surrounds a display area, in which the pixel is arranged, on the flattened second surface; and forming a light transmitting path layer that covers the second surface on which the light shielding film is formed.
地址 Tokyo JP