发明名称 |
LIQUID PROCESSING DEVICE USING PLASMA |
摘要 |
Disclosed is a liquid processing device using plasma. The liquid processing device using plasma according to an embodiment of the present invention comprises: a container having an inner space formed to store liquid and storing the liquid; one or more first electrodes having a part immersed in the liquid; a second electrode placed at the lower part of the container and separated from the first electrodes; and a power supply part connected to the first electrodes and the second electrode to apply voltage between the first electrodes and the second electrode. When the voltage is applied between the first electrodes and the second electrode, plasma is generated based on gas existing on the surface of the liquid and the liquid can be processed by introducing the plasma into the liquid. |
申请公布号 |
KR20140136147(A) |
申请公布日期 |
2014.11.28 |
申请号 |
KR20130056261 |
申请日期 |
2013.05.20 |
申请人 |
KOREA BASIC SCIENCE INSTITUTE |
发明人 |
SEOK, DONG CHAN;JUNG, YONG HO;LHO, TAI HYEOP |
分类号 |
C02F1/46;H05H1/24 |
主分类号 |
C02F1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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