发明名称 SIMPLIFIED ISOLATION LAYER BASED ON IBAD-MGO METAL SUBSTRATE AND PREPARATION METHOD THEREOF
摘要 A simplified isolation layer based on an IBAD-MgO metal substrate. The simplified isolation layer is a single-layer CeO2 isolation layer deposited on the IBAD-MgO metal substrate. A depth of the simplified isolation layer is 50-500nm. Also comprised is a preparation method of the isolation layer.
申请公布号 WO2014183237(A1) 申请公布日期 2014.11.20
申请号 WO2013CN01059 申请日期 2013.09.12
申请人 SHANGHAI SUPER CONDUCTOR TECHNOLOGY CO., LTD. 发明人 LI, YIJIE;LIU, LINFEI;XIAO, GUINA
分类号 C23C14/08 主分类号 C23C14/08
代理机构 代理人
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