ANTI-ESD SILOXANE COATING COMPOSITION WITH HARDNESS AND LEVELING LAYER
摘要
The present invention relates to an antistatic coating composition to form a planarization film. More specifically, the present invention provides an antistatic coating composition to form a high-hardness planarization film capable of providing the high-hardness planarization film to eliminate static with excellent surface hardness and film conditions on a substrate even when time has elapsed, as well as excellent transparency, by including a high hardness siloxane binder manufactured using a sol-gel method.
申请公布号
KR20140127106(A)
申请公布日期
2014.11.03
申请号
KR20130045712
申请日期
2013.04.24
申请人
DONGJIN SEMICHEM CO., LTD.
发明人
LEE, JUNG YUL;BYEON, JA HUN;AN MIN SHI;HONG, WOO SUNG;PARK, SUNG YEOUN;LEE, JIN KYU;KIM, DONG MIN