发明名称 ANTI-ESD SILOXANE COATING COMPOSITION WITH HARDNESS AND LEVELING LAYER
摘要 The present invention relates to an antistatic coating composition to form a planarization film. More specifically, the present invention provides an antistatic coating composition to form a high-hardness planarization film capable of providing the high-hardness planarization film to eliminate static with excellent surface hardness and film conditions on a substrate even when time has elapsed, as well as excellent transparency, by including a high hardness siloxane binder manufactured using a sol-gel method.
申请公布号 KR20140127106(A) 申请公布日期 2014.11.03
申请号 KR20130045712 申请日期 2013.04.24
申请人 DONGJIN SEMICHEM CO., LTD. 发明人 LEE, JUNG YUL;BYEON, JA HUN;AN MIN SHI;HONG, WOO SUNG;PARK, SUNG YEOUN;LEE, JIN KYU;KIM, DONG MIN
分类号 C09D183/04;C09D5/24 主分类号 C09D183/04
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