发明名称 Photovoltaic device and process for producing photovoltaic device
摘要 A photovoltaic device that exhibits increased open-circuit voltage and an improved fill factor due to an improvement in the contact properties between the n-layer and a back-side transparent electrode layer or intermediate contact layer, and a process for producing the photovoltaic device. The photovoltaic device comprises a photovoltaic layer having a p-layer, an i-layer and an n-layer stacked on top of a substrate, wherein the n-layer comprises a nitrogen-containing n-layer and an interface treatment layer formed on the opposite surface of the nitrogen-containing n-layer to the substrate, the nitrogen-containing n-layer comprises nitrogen atoms at an atomic concentration of not less than 1% and not more than 20%, and has a crystallization ratio of not less than 0 but less than 3, and the interface treatment layer has a crystallization ratio of not less than 1 and not more than 6.
申请公布号 US8859887(B2) 申请公布日期 2014.10.14
申请号 US200912997418 申请日期 2009.07.08
申请人 Mitsubishi Heavy Industries, Ltd. 发明人 Tsuruga Shigenori;Yamaguchi Kengo;Goya Saneyuki;Sakai Satoshi
分类号 H01L31/105;H01L31/18;H01L27/142;H01L31/076;H01L31/077 主分类号 H01L31/105
代理机构 代理人 Kanesaka Manabu;Hauptman Benjamin J.
主权项 1. A photovoltaic device comprising a photovoltaic layer and a back-side transparent electrode layer, the photovoltaic layer having a p-layer, an i-layer and an n-layer stacked on top of a substrate, wherein the n-layer comprises a nitrogen-containing n-layer, and an interface treatment layer formed on an opposite surface of the nitrogen-containing n-layer to the substrate, the nitrogen-containing n-layer comprises nitrogen atoms at an atomic concentration of not less than 1% and not more than 20%, and has a crystallization ratio of not less than 0 but less than 3, the interface treatment layer contacts the back-side transparent electrode layer, and the interface treatment layer has a crystallization ratio of not less than 1 and not more than 6, and has a conductivity of not less than 1 S/cm and not more than 100 S/cm.
地址 Tokyo JP