发明名称 |
CHARGED PARTICLE BEAM APPARATUS |
摘要 |
An object of the present invention is to provide a charged particle beam apparatus that effectively removes electrical charges from an electrostatic chuck. In order to achieve the above object, the charged particle beam apparatus of the present invention includes a sample chamber that maintains a space containing an electrostatic chuck mechanism (5) in a vacuum state; and in which the charged particle beam apparatus includes an ultraviolet light source (6) to irradiate ultraviolet light within the sample chamber, and a irradiation target member irradiated by the ultraviolet light; and the irradiation target member is placed perpendicular to the adsorption surface of the electrostatic chuck. |
申请公布号 |
KR20140119080(A) |
申请公布日期 |
2014.10.08 |
申请号 |
KR20147021509 |
申请日期 |
2013.01.28 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
EBIZUKA YASUSHI;KANNO SEIICHIRO;NISHIHARA MAKOTO;FUJITA MASASHI |
分类号 |
H01J37/20 |
主分类号 |
H01J37/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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