| 摘要 |
PROBLEM TO BE SOLVED: To provide an acid diffusion controlling agent with which a photoresist composition excellent in LWR (line width roughness) performance, EL (exposure latitude) performance and pattern features can be prepared.SOLUTION: The acid diffusion controlling agent comprises a nitrogen-containing compound which includes a group having -SO- or -SO- in a carbon-carbon bond of a monovalent hydrocarbon group having 2 to 30 carbon atoms. The nitrogen-containing compound is preferably a compound expressed by formula (1) shown below. In formula (1), Rand Rrepresent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms, and Rand Rmay be bonded to each other together with a nitrogen atom bonded thereto to form a ring structure; X represents a single bond, a carbonyl group, an ether group, an imino group, a divalent hydrocarbon group having 1 to 20 carbon atoms, or a group composed of a combination of these groups; Y represents a group having -SO- or -SO- in a carbon-carbon bond of a monovalent hydrocarbon group having 2 to 30 carbon atoms, and a part of or the entire hydrogen atoms in the group represented by Y may be substituted. |
