| 摘要 |
A measurement apparatus includes: a holding unit (3) that has a placement surface on which at least a specimen to be observed is placed; an illumination unit (9) that emits illumination light to be irradiated to the placement surface; a detection unit (60, 70, 80) that is freely arrangeably provided on the placement surface and detects an intensity of the illumination light on the placement surface; a field stop (90) that has an aperture (90a) formed therein and stops down a field on the placement surface by an image of the aperture (90a) provided on an optical path of the illumination unit (9), the aperture (90a) through which the illumination light passes and an image of the illumination light is projected on the placement surface; and a computation unit (42, 42a, 403) that computes an intensity of the illumination light per unit area on the placement surface, based on an area of the aperture (90a) of the field stop (90) and the intensity of the illumination light detected by the detection unit (60, 70, 80). |
