METHOD FOR FABRICATION OF ISOLATED MICRO-AND NANO-STRUCTURES USING SOFT OR IMPRINT LITHOGRAPHY

摘要

PROBLEM TO BE SOLVED: To provide a method for fabrication of isolated micro-and nano-structures using soft or imprint lithography.SOLUTION: The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro-and nanoscale replica molding, and a first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing freestanding, isolated nano-structures of any shape using soft or imprint lithography techniques.