| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing an infrared reflection film superior in adiabaticity, durability, visible light transmittance and adhesion of an infrared reflection layer and superior in productivity.SOLUTION: A method for producing an infrared reflection film comprising: a metal layer forming step for forming a metal layer (25) on a transparent film substrate (10); a metal oxide layer forming step for forming a front side metal oxide layer by a direct current sputtering directly onto the metal layer (25); and a transparent protective layer forming step for forming a transparent protective layer (22) on the metal oxide layer in that order, in which a sputter target used in the direct current sputtering in the metal oxide layer forming step contains zinc atoms and tin atoms, the target formed by sintering metal oxide of at least one of zinc oxide and tin oxide and metal powder is used, and oxygen concentration of an inert gas and oxygen gas introduced in a sputtering deposition chamber is 8 volume% or less. |
