| 发明名称 |
MASK FOR DUAL TONE DEVELOPMENT |
| 摘要 |
A mask for dual tone development including a opening pattern region and a partial transparent pattern is provided. The opening pattern region includes a plurality of transparent patterns and a plurality of opaque patterns, and a plurality of opening patterns is defined in a photoresist for dual tone development by the transparent patterns and the opaque patterns. The partial transparent pattern surrounds the opening pattern region. |
| 申请公布号 |
US2014255829(A1) |
申请公布日期 |
2014.09.11 |
| 申请号 |
US201313896334 |
申请日期 |
2013.05.17 |
| 申请人 |
Powerchip Technology Corporation |
发明人 |
Chang Yi-Shiang;Lin Chia-Chi;Lin Hung-Ming |
| 分类号 |
G03F1/50 |
主分类号 |
G03F1/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A mask for dual tone development, comprising:
a opening pattern region, comprising a plurality of transparent patterns and a plurality of opaque patterns, wherein a plurality of opening patterns is defined in a photoresist for dual tone development by the transparent patterns and the opaque patterns; and a partial transparent pattern, surrounding the opening pattern region. |
| 地址 |
Hsinchu TW |
