| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device which is advantageous in achieving improvement in the accuracy of alignment between a shot area on board and an original plate and improvement in throughput.SOLUTION: The exposure device comprises: an alignment measurement unit for detecting a first mark among a plurality of marks formed on a board via a mark of an original plate and a protection optical system, and measuring the position of the first mark on the board; an off-axis measurement unit for detecting, in parallel with detection of the first mark, a second mark different from the first mark, and measuring the position of the second mark on the board; and a control unit for controlling alignment between the original plate and each shot area. The off-axis measurement unit uses information indicating a distance between the alignment measurement unit and the off-axis measurement unit as it measures the position of the second mark on the board. The control unit uses the position of the first mark and the position of the second mark to acquire shape information, and adjusts alignment between the original plate and each shot area on the basis of the shape information so that a pattern of the original plate overlaps each shot area. |
