PHOTOACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME

摘要

The present invention relates to a photoactive compound having a novel structure and a photosensitive resin composition including the same, and the photoactive compound according to the present invention has excellent sensitivity due to efficient absorption to a UV light source by including a nitro group and a phosphonate structure, and has excellent retention rate, mechanical strength, heat resistance, chemical resistance and developing resistance by improving solubility of the photosensitive resin composition by excellent compatibility of the phosphonate structure and a binder resin. Therefore, the photosensitive resin composition according to the present invention is useful to cure a column spacer, an overcoat, a passivation material and the like of a liquid crystal display device, and is useful in view of a high temperature process property.

主权项

1. A photoactive compound represented by the following Formula 1: wherein R1 is a C1˜C8 alkyl group; or a C6˜C12 aryl group, R2 is a C1˜C8 alkyl group; or a C1˜C8 alkyl group substituted by one or more substituent groups selected from the group consisting of R, OR, SR and COR, R3 and R4 are hydrogen; or are connected to each other to form a condensed ring, R5 is a C1˜C8 alkyl group; or a C6˜C12 aryl group, A is a C2˜C15 alkylene group; or a C2˜C15 alkylene group substituted by one or more substituent groups selected from the group consisting of R, OR, SR, COR and OCOR, and R is selected from a C1˜C10 alkyl group; a C1˜C10 haloalkyl group; or a C7˜C13 aralkyl group.