| 发明名称 | Wave-shaped mask of fabricating nano-scaled structure | ||
| 摘要 | A wave-shaped mask for fabricating a nano-scale structure is disclosed. The wave-shaped mask comprises an elastomeric transparent substrate having an upper surface and a lower surface, and a light-penetrable thin film layer disposed on the upper surface of the elastomeric transparent substrate. The upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer are in a periodic wave shape, and the lower surface of the elastomeric transparent substrate is in a plate shape. | ||
| 申请公布号 | US8795928(B2) | 申请公布日期 | 2014.08.05 |
| 申请号 | US201213422921 | 申请日期 | 2012.03.16 |
| 申请人 | National Taiwan University | 发明人 | Lee Si-Chen;Chuang Fang-Tzu;Jiang Yu-Wei |
| 分类号 | G03F1/00;G03F1/50;G03F1/60 | 主分类号 | G03F1/00 |
| 代理机构 | Huffman Law Group, PC | 代理人 | Huffman Law Group, PC |
| 主权项 | 1. A wave-shaped mask for fabricating a nano-scale structure, the wave-shaped mask comprising: an elastomeric transparent substrate comprising an upper surface and a lower surface; and a light-penetrable thin film layer disposed on the upper surface of the elastomeric transparent substrate, wherein the upper surface of the elastomeric transparent substrate and the light-penetrable thin film layer comprise aperiodic curved wave shape, and wherein the lower surface of the elastomeric transparent substrate is in plate shape; wherein the periodic curved wave shape of the elastomeric transparent substrate and the light penetrable thin film layer are formed because the Young's modulus of the light-penetrable thin film layer is larger than the Young's modulus of the elastomeric transparent substrate. | ||
| 地址 | Taipei TW | ||