发明名称 Method for providing a respective flat working layer on each of the two working disks of a double-side processing apparatus
摘要 A method provides a respective flat working layer on each of two working disks of a double-side processing apparatus including a ring-shaped upper working disk, a ring shaped lower working disk and a rolling apparatus that are rotatably mounted about an axis of symmetry of the double-side processing apparatus. The method includes applying a lower intermediate layer and upper intermediate layer on respective surfaces of the lower and upper working disks. Then, simultaneous leveling of both intermediate layers is performed by moving trimming apparatuses on cycloidal paths over the intermediate layers using the rolling apparatus and the respective outer toothing under pressure and with addition of a cooling lubricant, so as to provide a material removal from the intermediate layers. A lower working layer of uniform thickness is then applied to the lower intermediate layer and an upper working layer of uniform thickness is applied to the upper intermediate layer.
申请公布号 US8795776(B2) 申请公布日期 2014.08.05
申请号 US201213349639 申请日期 2012.01.13
申请人 Siltronic AG 发明人 Pietsch Georg
分类号 B05D3/12;B24B37/00;H01L21/304 主分类号 B05D3/12
代理机构 Leydig, Voit & Mayer, Ltd. 代理人 Leydig, Voit & Mayer, Ltd.
主权项 1. A method for providing a respective flat working layer on each of two working disks of a double-side processing apparatus including a ring-shaped upper working disk, a ring shaped lower working disk and a rolling apparatus, with each of the working disks and the rolling apparatus being rotatably mounted about an axis of symmetry of the double-side processing apparatus, the method comprising each of the following steps in the stated order: (a) applying a lower intermediate layer on a surface of the lower working disk and an upper intermediate layer on a surface of the upper working disk, wherein a composition of the working layers is different from a composition of the intermediate layers; (b) simultaneously leveling both intermediate layers using at least three trimming apparatuses, each trimming apparatus including a trimming disk, at least one trimming body including an abrasive substance, and an outer toothing, the leveling including moving the trimming apparatuses on cycloidal paths over the intermediate layers using the rolling apparatus and the respective outer toothing under pressure and with addition of a cooling lubricant that is free of substances having an abrasive action, so as to provide a material removal from the intermediate layers; and (c) applying a lower working layer of uniform thickness to the lower intermediate layer and an upper working layer of uniform thickness to the upper intermediate layer.
地址 Munich DE