发明名称 A STRIP-SHAPED GATE-MODULATED TUNNELING FIELD EFFECT TRANSISTOR AND A PREPARATION METHOD THEREOF
摘要 The present invention discloses a strip-shaped gate-modulated tunneling field effect transistor and a preparation method thereof, belonging to a field of field effect transistor logic device and the circuit in CMOS ultra large scale integrated circuit (ULSI). The tunneling field effect transistor includes a control gate, a gate dielectric layer, a semiconductor substrate, a highly-doped source region and a highly-doped drain region, where the highly-doped source region and the highly-doped drain region lie on both sides of the control gate, respectively, the control gate has a strip-shaped structure with a gate length greater than a gate width, and at one side thereof is connected to the highly-doped drain region and at the other side thereof extends laterally into the highly-doped source region; a region located below the control gate is a channel region; and the gate width of the control gate is less than twice width of a source depletion layer. The device modulates the source-side tunneling junction by using the strip-shaped gate structure, achieves the effect equivalent to that the source junction has a steep doping concentration gradient, and improves the TFET device performance; and the preparation method thereof is simple.
申请公布号 US2014203324(A1) 申请公布日期 2014.07.24
申请号 US201314130631 申请日期 2013.07.08
申请人 Peking University 发明人 Huang Ru;Huang Qianqian;Qiu Yingxin;Zhan Zhan;Wang Yangyuan
分类号 H01L29/78;H01L29/08;H01L29/66 主分类号 H01L29/78
代理机构 代理人
主权项 1. A tunneling field effect transistor, comprising a semiconductor substrate, a highly-doped source region, a highly-doped drain region, a gate dielectric layer, and a control gate, where the highly-doped source region and the highly-doped drain region lie on both sides of the control gate, respectively, wherein, the control gate has a strip-shaped structure with a gate length greater than a gate width, and at one side thereof is connected to the highly-doped drain region and at the other side thereof extends laterally into the highly-doped source region; a region located below the control gate is a channel region; and the gate width of the control gate is less than twice width of a source depletion layer.
地址 Beijing CN