发明名称 STRUCTURE, METHOD OF MAKING A STRUCTURE, AND METHOD OF REDUCING GALVANIC CORROSION
摘要 A structure is disclosed herein. The structure includes a first component including a first material, and a second component joined to the first component. The second component includes a second material that is dissimilar from the first material. A spacer is disposed between the first and second components, and the spacer eliminates galvanic corrosion of the first component at an interface between the first component and the second component. The spacer includes a first layer consisting of the first material, a second layer bonded to the first layer and consisting of a third material, and a third layer bonded to the second layer and consisting of the second material. The third material of the second layer is different from the first material and different from the second material. Also disclosed herein are a method of making the structure, and a method for reducing galvanic corrosion.
申请公布号 US2014199114(A1) 申请公布日期 2014.07.17
申请号 US201313739200 申请日期 2013.01.11
申请人 GM GLOBAL TECHNOLOGY OPERATIONS LLC 发明人 Deshpande Kiran;Kulkarni Kaustubh Narhar
分类号 B23K20/02 主分类号 B23K20/02
代理机构 代理人
主权项 1. A structure, comprising: a first component including a first material; a second component joined to the first component, the second component including a second material that is dissimilar from the first material; and a spacer disposed between the first component and the second component, the spacer to eliminate galvanic corrosion of the first component at an interface between the first component and the second component, and the spacer comprising: a first layer consisting of the first material;a second layer bonded to the first layer, the second layer consisting of a third material, the third material being different from the first material and different from the second material; anda third layer bonded to the second layer, the third layer consisting of the second material.
地址 Detroit MI US