发明名称 PATTERN EXPOSURE METHOD AND PATTERN EXPOSURE APPARATUS
摘要 A belt-like work (11) provided with a photosensitive layer is conveyed in a work conveying direction F at a work conveying speed V. An illuminating section (30) illuminates a photomask (29) in an exposure period T synchronized with the work conveying speed V. The photomask (29) is disposed at a proximity gap from the belt-like work (11). Mask patterns (33) on the photomask (29) are exposed on the belt-like work (11) to form periodic patterns thereon.
申请公布号 KR101420669(B1) 申请公布日期 2014.07.17
申请号 KR20087008409 申请日期 2006.09.05
申请人 发明人
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
代理机构 代理人
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