| 摘要 |
PROBLEM TO BE SOLVED: To provide a magnetic disk substrate polishing liquid composition that enables reduction in a scratch to be attained without losing productivity, and to provide a magnetic disk substrate manufacturing method, using the magnetic disk substrate polishing liquid composition.SOLUTION: The present invention relates to a magnetic disk substrate polishing liquid composition that contains: (a) a silica particle; (b) an acid, (c) an oxidant; (d) an oxyalkylene alkyl ether sulfate compound represented by the below-mentioned general formula (I); (e) an anionic polymer having at least one of a sulfonic acid group and a carboxylic acid group; and (f) water, and the magnetic disk substrate polishing liquid composition has a pH of less than 3.0 at 25°C. R-O-(EO)n-SOM...(I), where R denotes a straight-chain or branched hydrocarbon group containing 9 to 17 carbon atoms, M denotes hydrogen, an alkaline metal, an ammonium ion or an alkylammonium ion, EO denotes an ethylene oxide group, and n denotes a natural number of 2 or more and 4 or less. |
