| 摘要 |
An exposure apparatus EX exposes a substrate P by filling a liquid 1 between a projection optical system PL and the substrate P, and projecting the image of a pattern onto the substrate P through the projection optical system PL and the liquid 1, and includes a liquid removing mechanism 40 that intermittently blows a gas against a reference member 7 disposed in a vicinity of the image plane of the projection optical system PL, movable mirror 55, and the like, to which the liquid 1 is adhered in order to remove that liquid 1. By such a constitution, it is possible to provide an exposure apparatus that can remove unnecessary liquid when exposing a substrate by projecting a pattern onto the substrate through the projection optical system and the liquid, and to form a desired device pattern on the substrate. |
