A MANUFACTURING METHOD OF METAL FILM WITH NANO PATTERN
摘要
<p>The present invention relates to a method of manufacturing a metal film with nanopatterns. The method of manufacturing a metal film with nanopatterns comprises: a first step of forming a sacrificial layer on the upper surface of a substrate; a second step of forming a seed layer for plating on the upper surface of the sacrificial layer; a third step of forming a metal film on the seed layer through electroplating; a fourth step of forming a photosensitive resin layer on the upper surface of the metal film and then forming a nanopattern made of the photosensitive resin layer on the upper surface of the metal film through exposure patterning and developing processes; and a fifth step of removing the sacrificial layer to separate the metal film with the nanopattern formed thereon from the substrate. According to the present invention, fine nanopatterns of equal to or less than 100 nm are uniformly formed while the present invention reduces process costs and time by simplifying processes, and the metal film with the nanopattern is simply manufactured.</p>
申请公布号
KR20140085968(A)
申请公布日期
2014.07.08
申请号
KR20120155896
申请日期
2012.12.28
申请人
KOREA ADVANCED NANO FAB CENTER
发明人
KIM, CHANG HWAN;HWANG, SEON YONG;JUNG, SANG HYUN;SHIN, HYUN BEOM;KANG, HO KWAN;KO, CHUL GI