| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning method of a thin film deposition apparatus which allows for cleaning matching the situation of the apparatus, and to provide a thin film deposition method, a thin film deposition apparatus, and a program.SOLUTION: In a cleaning method of a heat treatment apparatus 1, first cleaning step for removing deposits adhering to the inside of the heat treatment apparatus 1 by supplying the cleaning gas into a reaction tube 2, when the first cleaning start conditions are satisfied, and second cleaning step for removing deposits adhering to the inside of the heat treatment apparatus 1 by supplying the cleaning gas, different from that in the first cleaning step, into the reaction tube 2, when the second cleaning start conditions, different from the first cleaning start conditions, are satisfied are carried out. |
