| 摘要 |
The present invention relates to a method for treating a substrate support on which a substrate is placed. The method comprises a step of decomposing byproducts deposited on the surface of a substrate support and a step of forming a film having corrosion resistance on the surface of the substrate support by reacting the decomposed byproducts. Thus, the present invention can reduce the contamination of the inside of a processing chamber and the substrate caused by the byproducts by removing the byproducts generated by a substrate treatment process to clean the substrate support. Also, the present invention can prevent the corrosion of the substrate support caused by the byproducts by removing the corrosive byproducts generated in case of using corrosive processing materials used for a substrate. |
