| 摘要 |
PROBLEM TO BE SOLVED: To lighten exposure unevenness due to aberration of a projection optical system.SOLUTION: A projection exposure apparatus comprises a plurality of exposure means Ex1, Ex2, and Ex3 which perform overlay exposure of a particular exposure pattern to a surface to be exposed S by a light source element group 2 in which a plurality of light source elements are arrayed and a projection optical system 3 which projects a pattern formed by the light source element group 2 onto a surface to be exposed. One of the plurality of exposure means arranges the light source element group 2 at a first position within an effective field of view Vr of the projection optical system 3, and another one of the plurality of exposure means arranges the light source element group 2 at a second position, which is different from the first position, within the effective field of view Vr of the projection optical system 3. |
