发明名称 pvd chamber and process for over-coating layer to improve emissivity for low emissivity coating
摘要 A method for making low emissivity panels, including control the ion characteristics, such as ion energy, ion density and ion to neutral ratio, in a sputter deposition process of a layer deposited on a thin conductive silver layer. The ion control can prevent or minimize degrading the quality of the conductive silver layer, which can lead to better transmittance in visible regime, block more heat transfer from the low emissivity panels, and potentially can reduce the requirements for other layers, so that the overall performance, such as durability, could be improved.
申请公布号 US2014170338(A1) 申请公布日期 2014.06.19
申请号 US201213714797 申请日期 2012.12.14
申请人 INTERMOLECULAR INC. 发明人 Ding Guowen;Boyce Brent;Hassan Mohd Fadzli Anwar;Le Minh Huu;Sun Zhi-Wen Wen;Wang Yu
分类号 C23C14/34 主分类号 C23C14/34
代理机构 代理人
主权项 1. A method for coating a substrate, the method comprising providing the substrate; depositing a first layer over the substrate, wherein the first layer comprises a conductive material,wherein the thickness of the first layer is less than 20 nm; depositing a second layer on the first layer, wherein the depositing is a sputter deposition process,wherein the sputter deposition process produces ion and neutral species;wherein the ion to neutral species ratio is altered by passing the ion and neutral species through a shield maintained at a voltage.
地址 San Jose CA US
您可能感兴趣的专利