| 摘要 |
PURPOSE: A substrate processing device and a method are provided to form a particle size of a hydrophobic solution as a micrometer or a nanometer. CONSTITUTION: A substrate processing device (10) includes a chamber (100), a support member (200), a nozzle unit (300), and a voltage source (400). The chamber forms an internal space. The support member is provided to the internal space. A substrate is located on an upper side of the support member. The nozzle unit sprays a film forming solution on an upper side of the substrate. The voltage source connects one end to the nozzle unit and generates the potential difference between the nozzle unit and the support member. |
