| 摘要 |
<p>Provided are methods and an apparatus for plasma-processing a substrate in order to improve process results. The present invention relates to multi-layer segmented electrodes and methods of forming and operating the multi-layer segmented electrodes. The multi-layer segmented electrodes include first layers including a plurality of first electrode segments, and the first electrode segments are spaced apart from each other in a first direction. The multi-layer segmented electrodes include second layers which include a plurality of second electrode segments, and the second layers are spaced apart from the first layers in a second direction perpendicular to the first direction. At least two segmented electrodes among the first electrode segments can be individually controlled with respect to at least one electronic parameter.</p> |
