发明名称 |
SELECTIVELY MODIFIED NANOPOROUS STRUCTURE AND PRODUCTION METHODS THEREOF |
摘要 |
The present invention provides a method for selectively modifying a structure having nanopores which provides a structure having penetration pores of nanosize; fills the pores with surfactants; exposes a part of the inner surface of the pores by removing the part of the surfactants from both ends of the pores; modifies the exposed inner surface with a first compound; exposes the inner surface of the pores which are not modified with the first compound by removing the surfactants remaining in the pores; and modifies the exposed inner surface with a second compound different from the first compound which is not modified with the first compound. |
申请公布号 |
KR20140064409(A) |
申请公布日期 |
2014.05.28 |
申请号 |
KR20120131713 |
申请日期 |
2012.11.20 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
SON, YOU HWAN;KIM, JAE EUN;JUNG, BO KYUNG;KANG, HYO RANG |
分类号 |
B82B3/00;A61L27/02;A61L27/14;A61L27/56 |
主分类号 |
B82B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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