发明名称 SELECTIVELY MODIFIED NANOPOROUS STRUCTURE AND PRODUCTION METHODS THEREOF
摘要 The present invention provides a method for selectively modifying a structure having nanopores which provides a structure having penetration pores of nanosize; fills the pores with surfactants; exposes a part of the inner surface of the pores by removing the part of the surfactants from both ends of the pores; modifies the exposed inner surface with a first compound; exposes the inner surface of the pores which are not modified with the first compound by removing the surfactants remaining in the pores; and modifies the exposed inner surface with a second compound different from the first compound which is not modified with the first compound.
申请公布号 KR20140064409(A) 申请公布日期 2014.05.28
申请号 KR20120131713 申请日期 2012.11.20
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 SON, YOU HWAN;KIM, JAE EUN;JUNG, BO KYUNG;KANG, HYO RANG
分类号 B82B3/00;A61L27/02;A61L27/14;A61L27/56 主分类号 B82B3/00
代理机构 代理人
主权项
地址