发明名称 ETCHING SOLUTION COMPOSITION FOR ETCHING MULTI-LAYERED FILM FORMED ON TEMPERED GLASS AND METHOD OF ETCHING MULTI-LAYERED FILM
摘要 Provided in an embodiment of the present invention is an etchant composition having an excellent etching selectivity to have an excellent film rejection performance and prevent the damage of the tempered glass while selectively etching a multi-layered thin film including a titanium oxide layer or a silicon oxide layer on the tempered glass. Moreover, provided in an embodiment of the present invention is a method for etching a multi-layered thin film using the etchant composition which can improve the visual effect by forming the various color on the tempered glass.
申请公布号 KR101399420(B1) 申请公布日期 2014.05.27
申请号 KR20120153870 申请日期 2012.12.26
申请人 CRUCIALTEC CO., LTD. 发明人 KIM, KUN WOO
分类号 C03C15/00;C09K13/00 主分类号 C03C15/00
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